Posted Date : June 27,2019
Product (RFP/RFQ/RFI/Solicitation/Tender/Bid Etc.) ID : SW-25490
Government Authority located in Mississippi; USA based organization looking for expert vendor for in-situ optical curvature measurement system.
[A] Budget: Looking for Proposals
[B] Scope of Service:
(1) Vendor needs to provide in-situ optical curvature measurement system for determination and evaluation of thin film stress.
- The system shall be installed onto the government’s existing ultra-high vacuum sputter deposition chamber.
- System shall allow simultaneous curvature measurements in two orthogonal directions so that asymmetric curvature is easily identifiable, saddle points can be easily detected, and crystal plane orientation is maintained so that crystallographic effects are more easily identified.
- Optical measurement system shall be user adjustable to allow accommodation of specific wafer sizes, curvatures, and geometries. System shall include linear translators to allow the optical spot pattern to be moved on the sample surface.
(2) All questions must be submitted no later than June 28, 2019.
(3) This bid is set aside for total small business.
[C] Eligibility:
- Onshore (USA Only);
[D] Work Performance:
Performance of the work will be Offsite. Vendor needs to carry work in their office location.
Budget :
Deadline to Submit Proposals: July 01,2019
Cost to Download This RFP/RFQ/RFI/Solicitation/Tender/Bid Document : 5 US$
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Product (RFP/RFQ/RFI/Solicitation/Tender/Bid Etc.) ID : SW-25490
Government Authority located in Mississippi; USA based organization looking for expert vendor for in-situ optical curvature measurement system.
[A] Budget: Looking for Proposals
[B] Scope of Service:
(1) Vendor needs to provide in-situ optical curvature measurement system for determination and evaluation of thin film stress.
- The system shall be installed onto the government’s existing ultra-high vacuum sputter deposition chamber.
- System shall allow simultaneous curvature measurements in two orthogonal directions so that asymmetric curvature is easily identifiable, saddle points can be easily detected, and crystal plane orientation is maintained so that crystallographic effects are more easily identified.
- Optical measurement system shall be user adjustable to allow accommodation of specific wafer sizes, curvatures, and geometries. System shall include linear translators to allow the optical spot pattern to be moved on the sample surface.
(2) All questions must be submitted no later than June 28, 2019.
(3) This bid is set aside for total small business.
[C] Eligibility:
- Onshore (USA Only);
[D] Work Performance:
Performance of the work will be Offsite. Vendor needs to carry work in their office location.
Budget :
Deadline to Submit Proposals: July 01,2019
Cost to Download This RFP/RFQ/RFI/Solicitation/Tender/Bid Document : 5 US$